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FotoCreativaBA LAUNCHES TWO INTERNATIONAL OPEN CALLS IN EXPANDED PHOTOGRAPHY IN JAPAN AND CHINA

Apply for a 12-month online laboratory combined with a one-month on-site residency in Kurashiki, Japan (or Chongqing, China) for visual artists, photographers, and researchers working in expanded photography.

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Kurashiki, Japan (IDEA R LAB) and Chongqing, China (OrganHaus at Beiyuan Glass Factory)
Mar 1, 2027 → May 31, 2028

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Heads up: this show’s exhibition window can overlap other calls you enter - the same piece can’t hang in two places at once.Check conflicts →

FotoCreativaBA offers two international artist residency programs in expanded photography and contemporary art: one in Kurashiki, Japan (in collaboration with IDEA R LAB) and another in Chongqing, China (with OrganHaus). Both are open to visual artists, photographers, and researchers from anywhere in the world.

The Japan Residency combines a twelve-month online laboratory (March 2027 – February 2028) with a one-month on-site residency in Kurashiki during March, April, or May 2028. The online phase includes monthly theoretical and creative triggers connecting expanded photography with Japanese aesthetics (Wabi-Sabi, Kintsugi, Ma interval, Provoke movement), individual curatorial mentorship with program director Natheim, and group sessions with guest artists. The on-site phase focuses on context-based exploration, material investigation with local industrial waste, and dialogue with the Kurashiki community.

  • Shared facilities and accommodation during on-site phase
  • Airfare and materials not covered

The China Residency combines twelve months of online curatorial training (September 2026 – August 2027) with a one-month on-site residency in Chongqing, distributed in flexible cohorts of three or four artists throughout 2027–2028. The program includes shared studio space, accommodation, support from the OrganHaus team, and connection with the local artistic community.

  • Shared studio space and accommodation
  • Support from OrganHaus team
  • Connection with local artistic community
  • Airfare, visa, insurance, and personal expenses not covered
  • China Residency application deadline: August 15, 2026
  • Japan Residency application deadline: December 30, 2026

Both programs are bilingual (Spanish/English) and are open to artists interested in expanded photography, interdisciplinary practices, and transcultural dialogue. No application fee is mentioned.

Inquiries and applications: [email protected]

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Theme
The programs explore expanded photography and contemporary art, connecting photography with Japanese aesthetics (Wabi-Sabi, Kintsugi, Ma interval, Provoke movement) in the Japan program and offering interdisciplinary curatorial training with transcultural dialogue in the China program.
Eligibility
Open to visual artists, photographers, and researchers from anywhere in the world interested in expanded photography, interdisciplinary practices, and transcultural dialogue.
Audience
Visual artists, photographers, and researchers from anywhere in the world

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