The program invites individual artists and collectives to apply for Extended Research Residencies to support the research and development of new or ongoing projects.
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Get matched →The Onassis AiR program supports individual artists and collectives in the research and development of new or ongoing projects. Residents gain access to resources, personalized mentoring, peer-to-peer feedback, and engage with the local artistic scene, the Onassis AiR community, and the wider Onassis Culture ecosystem. It offers time and space for experimentation, capacity-building activities, and opportunities to share works in progress and explore possibilities for production and dissemination. Participants are invited to engage with Athens and Fellows from other programs and networks, embracing knowledge sharing and exchange.
The program continues its focus on applied arts, dedicating four residencies to research in the field of fashion, building on an invitation for projects that explore scale, materials, and collaborative processes. Fashion designers can benefit from the Onassis Ready facilities, newly formed fashion studios, and a partnership with Central Saint Martins and the MA Fashion Course Leader Fabio Piras. For the first time, one residency will be realized in collaboration with the Cavafy Archive, offering direct access to C. P. Cavafy's manuscripts, notes, and personal library, enabling an interdisciplinary approach to archival study and literary heritage.
Every listing links to the organizer's official page. Always confirm deadlines, fees, and entry rules there before you apply.