FotoCreativaBA LANZA DOS CONVOCATORIAS INTERNACIONALES DE FOTOGRAFÍA EXPANDIDA EN JAPÓN Y CHINA
Apply for one of two international artist residencies combining online mentorship and curatorial training with in-person stays in Kurashiki, Japan or Chongqing, China.
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Get matched →- Deadline
- 138 days left
- Entry fee
- Not listed - check the source
- Award
- Shared studio and accommodation; airfare not covered
- Location
- Kurashiki, Japan (IDEA R LAB) and Chongqing, China (OrganHaus)
About
Overview
FotoCreativaBA, a platform dedicated to training, production, and research in expanded photography and contemporary art, offers two international artist residency calls for visual artists, photographers, and researchers from anywhere in the world. Both programs are bilingual (Spanish/English) and focus on expanded photography, interdisciplinary practices, and transcultural dialogue.
Japan Residency (IDEA R LAB, Kurashiki)
A 12-month online laboratory (March 2027–February 2028) combined with one month of in-person residency in Kurashiki (March, April, or May 2028). The online phase includes monthly creative and theoretical prompts connecting expanded photography with Japanese aesthetics (Wabi-Sabi, Kintsugi, Ma interval, Provoke movement), individual curatorial mentorship with program director Natheim, and group meetings with invited artists. The in-person phase focuses on site-based exploration, experimentation with industrial waste materials, and dialogue with the local Kurashiki community. Includes shared facilities and lodging; airfare and materials not covered.
China Residency (OrganHaus, Chongqing)
A 12-month online curatorial training program (September 2026–August 2027) combined with one month of in-person residency in Chongqing distributed in cohorts of three to four artists throughout 2027–2028. Includes shared studio space, accommodation, team support from OrganHaus, and connection with the local artistic community. Does not cover airfare, visa, insurance, or personal expenses.
Key Dates
- Japan residency application deadline: December 30, 2026
- China residency application deadline: August 15, 2026
Contact
For inquiries and applications: [email protected]
- Award
- Shared studio and accommodation; airfare not covered
- Theme
- Residencies in expanded photography and contemporary art, exploring connections between expanded photography and Japanese aesthetics or curatorial practice in dialogue with local artistic communities.
- Eligibility
- Open to visual artists, photographers, and researchers from anywhere in the world interested in expanded photography and interdisciplinary practices.
- Audience
- Visual artists, photographers, and researchers from anywhere in the world
- Contact
- [email protected]
Every listing links to the organizer's official page. Always confirm deadlines, fees, and entry rules there before you apply.